发明名称 Ultrasonic cleaning method and ultrasonic cleaning apparatus
摘要 <p>Subject: There is provided an ultrasonic cleaning method and an ultrasonic cleaning apparatus by which a high particle removal rate is obtained in a stable manner. Means for solving the problem: An ultrasonic cleaning method for cleaning an object to be cleaned in a liquid in which a gas is dissolved, by irradiating the liquid with ultrasonic waves, the method having the following steps. The liquid in which the gas is dissolved is prepared (S10). Bubbles are generated in the liquid while the liquid is irradiated with the ultrasonic waves, and a state where the bubbles containing the gas dissolved in the liquid continue to be generated is realized (S20). The object to be cleaned is cleaned in the state where the bubbles containing the gas continue to be generated (S30).</p>
申请公布号 EP2666552(A1) 申请公布日期 2013.11.27
申请号 EP20130167904 申请日期 2013.05.15
申请人 SILTRONIC AG 发明人 KUBO, ETSUKO;HAIBARA, TERUO;MORI, YOSHIHIRO;UCHIBE, MASASHI
分类号 B08B3/12;H01L21/02 主分类号 B08B3/12
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