发明名称 SUBSTRATE SUPPORTING TABLE, SUBSTRATE PROCESSING APPARATUS, AND MANUFACTURE METHOD FOR SEMICONDUCTOR DEVICE
摘要 The substrate supporting table includes a supporting plate that supports a substrate, a peripheral wall that encompasses a flow path of a coolant under the supporting plate and has an upper end enclosed by the supporting plate, a lower cover that encloses a bottom portion of the flow path and encloses a lower end of the peripheral wall. The substrate supporting table further includes a coolant supplying component that supplies a coolant through an upstream input of the flow path, a discharging component that discharges the coolant through a downstream output of the flow path, and a partition disposed between a supplying hole of the coolant supplying component and a discharging hole of the discharging component. A gap is formed between the partition and the bottom portion of the flow path.
申请公布号 KR101333926(B1) 申请公布日期 2013.11.27
申请号 KR20120021615 申请日期 2012.03.02
申请人 发明人
分类号 H01L21/3065;H01L21/683 主分类号 H01L21/3065
代理机构 代理人
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