发明名称 Device with oxide semiconductor thin film transistor
摘要 Disclosed is a semiconductor device which consumes low power and has high reliability and tolerance for electrostatic discharge. The semiconductor device includes, over a first substrate, a pixel portion and a driver circuit portion both of which have a thin film transistor having an oxide semiconductor layer. The semiconductor device further possesses a second substrate to which a first counter electrode layer and a second counter electrode layer are provided, and a liquid crystal layer is interposed between the first and second substrates. The first and second counter electrode layers are provided over the pixel portion and the driver circuit portion, respectively, and the second counter electrode layer has the same potential as the first counter electrode layer.
申请公布号 US8592814(B2) 申请公布日期 2013.11.26
申请号 US20100887606 申请日期 2010.09.22
申请人 YAMAZAKI SHUNPEI;SHISHIDO HIDEAKI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;SHISHIDO HIDEAKI
分类号 H01L29/04 主分类号 H01L29/04
代理机构 代理人
主权项
地址