| 摘要 |
The present invention discloses a heater monitoring system for a semiconductor thin film depositing apparatus. According to the present invention, the abnormal state of a heater is determined by detecting an RF signal which is inputted to a ground wire and a heating coil of the heater in a plasma process and comparing the RF signal with a normal signal range in a diagnosing unit or selectively comparing accumulated error data which is transmitted from an RF filter with a preset error range signal. A heater driving voltage is stably supplied by applying the heater driving voltage from a power supply unit to the heater through the RF filter. [Reference numerals] (40) Diagnosis unit |
