发明名称 |
Chromeless phase-shifting photomask with undercut rim-shifting element |
摘要 |
A phase-shifting photomask with a self aligned undercut rim-shifting element and methods for its manufacture are provided. One embodiment of the invention provides a method of manufacturing a phase-shifting photomask having a self aligned rim-shifting element, the method comprising: applying a patterning film to a first portion of a transparent substrate; etching the substrate to a depth to remove a second portion of the substrate not beneath the patterning film; etching the first portion of the substrate to undercut an area beneath the patterning film; and removing the patterning film, wherein the etched substrate forms a self-aligned undercut rim-shifting element.
|
申请公布号 |
US8591749(B2) |
申请公布日期 |
2013.11.26 |
申请号 |
US201213688879 |
申请日期 |
2012.11.29 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ANDERSON BRENT A.;RANKIN JED H. |
分类号 |
G03F1/28;G03F1/29 |
主分类号 |
G03F1/28 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|