发明名称 Nitride semiconductor device and method of manufacturing nitride semiconductor device
摘要 A nitride semiconductor device in which contact resistance between an ohmic electrode and an ohmic recess portion is reduced and a method of manufacturing the nitride semiconductor device are provided. The nitride semiconductor device includes: a first nitride semiconductor layer formed on a substrate; a second nitride semiconductor layer formed on the first nitride semiconductor layer and having a bandgap wider than a bandgap of the first nitride semiconductor layer; an ohmic recess portion formed in at least the second nitride semiconductor layer; and an ohmic electrode provided in contact with the ohmic recess portion. The ohmic recess portion includes a corrugated structure in at least a part of a plane in contact with the ohmic electrode.
申请公布号 US8592871(B2) 申请公布日期 2013.11.26
申请号 US201213494321 申请日期 2012.06.12
申请人 KAJITANI RYO;PANASONIC CORPORATION 发明人 KAJITANI RYO
分类号 H01L29/737 主分类号 H01L29/737
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