发明名称 |
Patterning of and contacting magnetic layers |
摘要 |
A method according to embodiments of the present invention comprises providing a magnetic stack comprising a magnetic layer sub-stack comprising magnetic layers and a bottom conductive electrode and a top conductive electrode electrically connecting the magnetic layer sub-stack at opposite sides thereof; providing a sacrificial pillar on top of the magnetic stack, the sacrificial pillar having an undercut with respect to an overlying second sacrificial material and a sloped foot with increasing cross-sectional dimension towards the magnetic stack, using the sacrificial pillar for patterning the magnetic stack, depositing an insulating layer around the sacrificial pillar, selectively removing the sacrificial pillar, thus creating a contact hole towards the patterned magnetic stack, and filling the contact hole with electrically conductive material.
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申请公布号 |
US8590139(B2) |
申请公布日期 |
2013.11.26 |
申请号 |
US201013202300 |
申请日期 |
2010.05.18 |
申请人 |
OP DE BEECK MARIA;LAGAE LIESBET;CORNELISSEN SVEN;IMEC;KATHOLIEKE UNIVERSITEIT LEUVEN, K.U. LEUVEN R&D |
发明人 |
OP DE BEECK MARIA;LAGAE LIESBET;CORNELISSEN SVEN |
分类号 |
H04R31/00;G11B5/127;G11B5/39 |
主分类号 |
H04R31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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