发明名称 Patterning of and contacting magnetic layers
摘要 A method according to embodiments of the present invention comprises providing a magnetic stack comprising a magnetic layer sub-stack comprising magnetic layers and a bottom conductive electrode and a top conductive electrode electrically connecting the magnetic layer sub-stack at opposite sides thereof; providing a sacrificial pillar on top of the magnetic stack, the sacrificial pillar having an undercut with respect to an overlying second sacrificial material and a sloped foot with increasing cross-sectional dimension towards the magnetic stack, using the sacrificial pillar for patterning the magnetic stack, depositing an insulating layer around the sacrificial pillar, selectively removing the sacrificial pillar, thus creating a contact hole towards the patterned magnetic stack, and filling the contact hole with electrically conductive material.
申请公布号 US8590139(B2) 申请公布日期 2013.11.26
申请号 US201013202300 申请日期 2010.05.18
申请人 OP DE BEECK MARIA;LAGAE LIESBET;CORNELISSEN SVEN;IMEC;KATHOLIEKE UNIVERSITEIT LEUVEN, K.U. LEUVEN R&D 发明人 OP DE BEECK MARIA;LAGAE LIESBET;CORNELISSEN SVEN
分类号 H04R31/00;G11B5/127;G11B5/39 主分类号 H04R31/00
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