发明名称 Mounting table structure and plasma film forming apparatus
摘要 A mounting table structure for mounting thereon an object to be processed to form a metal-containing thin film on the object includes a ceramic mounting table in which a chuck electrode and a heater are embedded, and a metal flange connected to a bottom surface of a peripheral portion of the mounting table. The mounting table structure further includes a metal base which is joined to the flange by screws and has a coolant path for flowing a coolant therein, and a metal seal member interposed between the flange and the base.
申请公布号 US8592712(B2) 申请公布日期 2013.11.26
申请号 US20100725902 申请日期 2010.03.17
申请人 FUJISATO TOSHIAKI;NASMAN RONALD;TOKYO ELECTRON LIMITED 发明人 FUJISATO TOSHIAKI;NASMAN RONALD
分类号 B23K10/00;H05H1/16 主分类号 B23K10/00
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