发明名称 |
Mounting table structure and plasma film forming apparatus |
摘要 |
A mounting table structure for mounting thereon an object to be processed to form a metal-containing thin film on the object includes a ceramic mounting table in which a chuck electrode and a heater are embedded, and a metal flange connected to a bottom surface of a peripheral portion of the mounting table. The mounting table structure further includes a metal base which is joined to the flange by screws and has a coolant path for flowing a coolant therein, and a metal seal member interposed between the flange and the base.
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申请公布号 |
US8592712(B2) |
申请公布日期 |
2013.11.26 |
申请号 |
US20100725902 |
申请日期 |
2010.03.17 |
申请人 |
FUJISATO TOSHIAKI;NASMAN RONALD;TOKYO ELECTRON LIMITED |
发明人 |
FUJISATO TOSHIAKI;NASMAN RONALD |
分类号 |
B23K10/00;H05H1/16 |
主分类号 |
B23K10/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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