发明名称 Liquid processing apparatus for substrate, method for generating processing liquid, and computer readable recording medium storing program for generating processing liquid therein
摘要 Provided is a liquid processing apparatus for a substrate, including a plurality of substrate processing units configured to process the substrate using a processing liquid, a processing liquid generating unit configured to dissolve a gas into a solvent to generate the processing liquid with a predetermined concentration where the processing liquid being supplied to one of the plurality of substrate processing units or being supplied to two or more of the plurality of substrate processing units simultaneously, and a control unit configured to control the plurality of substrate processing units. Also provided are a method for generating the processing liquid and a recording medium storing a program for generating the processing liquid. The liquid processing apparatus generates a processing liquid having a predetermined concentration regardless of the flow rate of the processing liquid used simultaneously.
申请公布号 US8590548(B2) 申请公布日期 2013.11.26
申请号 US20100876590 申请日期 2010.09.07
申请人 ESHIMA KAZUYOSHI;TOKYO ELECTRON LIMITED 发明人 ESHIMA KAZUYOSHI
分类号 H01L21/304 主分类号 H01L21/304
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