发明名称 |
Methods of forming a photo mask |
摘要 |
Methods of fabricating a photo mask are provided. The method includes collecting sample data, setting a preliminary mask layout, performing an optical proximity correction using the sample data and a preliminary mask layout to obtain an optimized preliminary mask layout, verifying the optimized preliminary mask layout to obtain a final mask layout, and fabricating the photo mask using the final mask layout. Verification of the optimized preliminary mask layout includes operating a verification simulator using the sample data and the optimized preliminary mask layout as input data to obtain verification image data. The verification image data includes a plurality of contours of a pattern at different vertical positions.
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申请公布号 |
US8595657(B2) |
申请公布日期 |
2013.11.26 |
申请号 |
US201213366553 |
申请日期 |
2012.02.06 |
申请人 |
CHA HOSUN;LEE EUNMI;LEE SUNGWOO;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHA HOSUN;LEE EUNMI;LEE SUNGWOO |
分类号 |
G06F17/50;G03F1/00;G06F19/00;G21K5/00 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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