发明名称 Bipolar semiconductor device and manufacturing method
摘要 A bipolar semiconductor device and manufacturing method. One embodiment provides a diode structure including a structured emitter coupled to a first metallization is provided. The structured emitter includes a first weakly doped semiconductor region of a first conductivity type which forms a pn-load junction with a weakly doped second semiconductor region of the diode structure. The structured emitter includes at least a highly doped first semiconductor island of the first conductivity type which at least partially surrounds a highly doped second semiconductor island of the second conductivity type.
申请公布号 US8592903(B2) 申请公布日期 2013.11.26
申请号 US20080324374 申请日期 2008.11.26
申请人 SCHULZE HANS-JOACHIM;PFIRSCH FRANK;INFINEON TECHNOLOGIES AUSTRIA AG 发明人 SCHULZE HANS-JOACHIM;PFIRSCH FRANK
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
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