发明名称 Non-volatile semiconductor memory device
摘要 A non-volatile semiconductor memory device having a memory cell in which operating potentials are few and the scale of the peripheral circuitry is reduced includes a select transistor having a source/drain on both sides of a channel of a semiconductor substrate and having a gate electrode disposed on the channel via a thick gate insulating film; an element isolation region formed on the semiconductor substrate in an area adjacent to the select transistor; an antifuse adjacent to the element isolation region, having a lower electrode formed on the semiconductor substrate and having an upper electrode disposed on the semiconductor substrate in an area between the element isolation region and lower electrode via a thin gate insulating film; and a connection contact electrically connecting the source and upper electrode and contacting the source and the upper electrode.
申请公布号 US8592942(B2) 申请公布日期 2013.11.26
申请号 US20090320102 申请日期 2009.01.16
申请人 KODAMA NORIAKI;HIDAKA KENICHI;KOBATAKE HIROYUKI;ONUMA TAKUJI;RENESAS ELECTRONICS CORPORATION 发明人 KODAMA NORIAKI;HIDAKA KENICHI;KOBATAKE HIROYUKI;ONUMA TAKUJI
分类号 H01L27/11 主分类号 H01L27/11
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