发明名称 |
SENSOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized. |
申请公布号 |
NL2010477(A) |
申请公布日期 |
2013.11.25 |
申请号 |
NL20132010477 |
申请日期 |
2013.03.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LAURENT THIBAULT;JACOBS JOHANNES HENRICUS WILHELMUS;KOK HAICO;VIJVER YURI;WAL JOHANNES;KNARREN BASTIAAN;VOOGD ROBBERT JAN;WESTERLAKEN JAN STEVEN CHRISTIAAN;RIJDT HANS;KOOIKER EELCO;HURKENS-MERTENS WILHELMINA MARGARETA JOZEF;TEILLET YOHANN BRUNO YVON |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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