| 摘要 |
PURPOSE: A manufacturing method of free-standing nano thin films is provided to prevent deformation of nano thin films during drying the same by performing a solvent exchange process which has base interfacial tension. CONSTITUTION: A manufacturing method of free-standing nano thin film comprises the following steps: (S110) forming a nano thin film on the upper part of a first base material; (S120) forming a second base material on the upper part of the nano thin film and forming laminate by removing the first base material; (S130) removing the second base material by using the first solvent from the laminate; and (S140) substituting the first solvent with the second solvent which has interfacial tension less than 20dyne/cm or less. The thickness of the nano thin film is 0.1-100nm. The boiling point of the second solvent is 100°C or less. The manufacturing method of free-standing nano thin-film additionally includes a step (S150) of drying the second solvent. [Reference numerals] (AA) Start; (BB) End; (S110) Forming a nano thin film on the upper part of a first base material; (S120) Forming a second base material on the upper part of the nano thin film and forming laminate by removing the first base material; (S130) Removing the second base material by using the first solvent from the laminate; (S140) Substituting the first solvent with the second solvent which has low interfacial tension; (S150) Drying |
