发明名称 |
Substrate processing apparatus for preventing powder deposition at inner wall of chamber |
摘要 |
A substrate processing apparatus is provided to prevent the thin film from being deposited on the inner wall by heating up the chamber lid appropriately. A substrate processing apparatus(100) comprises a chamber body having internal space; a chamber including the chamber lid uniting with the upper end of the chamber body and shutting the internal space tightly(110); a substrate pallet installed at the internal space of the chamber(120); a gas supply unit supplying the raw material to the top of the substrate pallet; a thermal conditioning unit which is installed in order to prevent that the thin film is evaporated on the inner wall of the chamber. |
申请公布号 |
KR101332295(B1) |
申请公布日期 |
2013.11.22 |
申请号 |
KR20070042022 |
申请日期 |
2007.04.30 |
申请人 |
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发明人 |
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分类号 |
H01L21/00;H01L21/02;H01L21/203 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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