EXPOSURE DEVICE, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide an exposure device capable of suppressing generation of exposure failure.SOLUTION: The exposure device sequentially exposes a plurality of shot areas of a substrate with exposure light through a liquid. The exposure device includes: an optical member having an emitting surface from which the exposure light is emitted; an immersion member that is disposed in at least a part of the surroundings of the optical member and forms a liquid immersion space so that an optical path of the exposure light at the emitting surface side is filled with a liquid; a stage movable while holding the substrate; and a control device that relatively moves the immersion member and the stage so that the liquid of the immersion space passes through a residual liquid generation area on the substrate.