POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SUBSTRATE

摘要

This polishing composition contains an abrasive grit and a water-soluble polymer. The water-soluble polymer is an anionic compound having an acid dissociation constant (pKa) of no greater than 3. Cited as specific examples of such a compound are polyvinyl sulfonic acid, polystyrene sulfonic acid, polyallyl sulfonic acid, polyacrylic acid ethyl sulfonic acid, polyacrylic acid butyl sulfonic acid, poly(2-acrylamide-2-methylpropane sulfonic acid), and polyisoprene sulfonic acid. The abrasive grit exhibits a negative zeta potential at a pH of 3.5 and lower. Colloidal silica can be cited as a specific example of such an abrasive grit.