| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing device etc. which prevents a process liquid from re-adhering to a substrate which has been subject to the liquid treatment.SOLUTION: A substrate holding part 21 horizontally holds a substrate W, a rotation driving part 30 rotates the substrate holding part 21 around a vertical shaft, and process liquid supply parts 411, 412, 24 supply the process liquid to the rotating substrate W. An upper guide ring 42 and a lower guide ring 43, which enclose the substrate W and are vertically overlapped with each other through a gap formed therebetween, rotate with the substrate holding part 21 and guide the process liquid thrown away from the substrate W side. A rotation cup 51 rotating with the substrate holding part 21 receives the guided process liquid and guides the process liquid downward. |
