DEFECT ANALYSIS SUPPORT DEVICE, PROGRAM EXECUTED BY DEFECT ANALYSIS SUPPORT DEVICE, AND DEFECT ANALYSIS SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a defective image analysis device capable of specifying a pattern or a layer on which a defect occurs by overlapping a defective image to be analyzed on design layout data, and a defective image analysis system capable of improving efficiency of work of selecting a layer from the design layout data.SOLUTION: A defect analysis support device divides an analysis target image for each layer of hierarchy corresponding to manufacturing steps to create a plurality of layer division images (602), determines the degree of coincidence of the respective layer division images with respective design layers of design layout data (604), and specifies a design layer having the highest degree of coincidence with one of the plurality of layer division images among the respective design layers as a design layer corresponding to the layer division image (605).