| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask capable of forming a fine and highly accurate hole pattern, a pattern transfer method and a method for manufacturing a flat panel display.SOLUTION: A photomask 1 has a patter for transfer including a translucent part 11 and a semi-translucent part 21, which is formed on a transparent substrate 10 and formed by patterning of at least the semi-translucent film 21. The translucent part 11 is formed by exposing the transparent substrate 10 by a width of 5 μm or less. The semi-translucent part 21 surrounds the translucent part 11 and comprises a semi-translucent film 20 formed on the transparent substrate 10. The semi-translucent film 20 has a permeability of 2 to 60% with respect to the representative wavelength of exposure light and a phase shift amount of 90° or less. |
