发明名称 INFRARED REFLECTIVE SUBSTRATE
摘要 Disclosed herein is an infrared reflective substrate that can be easily produced by application onto the surface of a base material, has a film having a small film thickness, and achieves both high light permeability and excellent infrared reflective performance. The infrared reflective substrate includes: a transparent base material; and an infrared reflective layer formed by applying a coating agent containing a complex of poly(3,4-disubstituted thiophene) and a polyanion onto the transparent base material, and has a total light transmittance of 60% or higher. The complex preferably has a conductivity of 0.15 (S/cm) or higher, and the infrared reflective layer preferably has a film thickness of 0.50 mum or less.
申请公布号 US2013308180(A1) 申请公布日期 2013.11.21
申请号 US201213983237 申请日期 2012.01.30
申请人 MIYANISHI KYOKO;FUJITA TAKAFUMI;HOSOMI TETSUYA;NAGASE CHEMTEX CORPORATION 发明人 MIYANISHI KYOKO;FUJITA TAKAFUMI;HOSOMI TETSUYA
分类号 G02B1/10;G02B1/04 主分类号 G02B1/10
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