发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
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申请公布号 |
US2013309607(A1) |
申请公布日期 |
2013.11.21 |
申请号 |
US201313870332 |
申请日期 |
2013.04.25 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KATAYAMA MAMI;FUKUDA SHUNJI;SAKAYORI KATSUYA |
分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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