发明名称 SURFACE POSITION MEASURING DEVICE, EXPOSURE EQUIPMENT, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce an effect of an atmosphere fluctuation to detect a surface position of a surface to be inspected with high accuracy.SOLUTION: A surface position measuring device comprises: a first surface position measuring system for receiving a first measuring beam projected to a surface to be inspected positioned on a principal surface or the vicinity of the principal surface from an oblique direction and reflected by the surface to be inspected, to detect a surface position of a first measuring region irradiated with the first measuring beam; and a second surface position measuring system for receiving a second measuring beam projected to the surface to be inspected from an oblique direction and reflected by the surface to be inspected, to detect a surface position of a second measuring region irradiated with the second measuring beam. A first region as a region in which the first measuring beam occupies on the principal surface, and a second region as a region in which the second measuring beam occupies on the principal surface are positioned along a first direction on the principal surface. When a direction perpendicular to the first direction on the principal surface is defined as a second direction, a part of projection of the first region to the second direction and a part of projection of the second region to the second direction are overlapped with each other.
申请公布号 JP2013236074(A) 申请公布日期 2013.11.21
申请号 JP20130086508 申请日期 2013.04.17
申请人 NIKON CORP 发明人 NAGAYAMA TADASHI
分类号 H01L21/027;G01B11/00;G03F9/02 主分类号 H01L21/027
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