发明名称 METHOD OF PRODUCING THIN FILM, METHOD OF MANUFACTURING DISPLAY PANEL, AND METHOD OF MANUFACTURING TFT SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method of producing a thin film capable of suppressing wraparound of a film effectively while forming a seal layer by using an ALD method, and to provide a method of manufacturing a display panel, and a method of manufacturing a TFT substrate.SOLUTION: The method of producing a thin film includes a mask arrangement step for arranging a mask 310 so that a thin film formation planned site A213, where a second seal layer 213 which is a thin film on a second buffer layer 211 is to be formed, is exposed above the buffer layer 211, a reductive plasma processing step for performing reductive plasma processing of the thin film formation planned site A213 following to the mask arrangement step, and a TMA exposure step for exposing the thin film formation planned site A213 to TMA following to the reductive plasma processing step.
申请公布号 JP2013235978(A) 申请公布日期 2013.11.21
申请号 JP20120107770 申请日期 2012.05.09
申请人 PANASONIC CORP 发明人 KIN ZENKEN;SATO TAKUYA
分类号 H01L21/316;H01L21/336;H01L29/786;H01L51/50;H05B33/04;H05B33/10;H05B33/22 主分类号 H01L21/316
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