| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique advantageous for reducing an overlay error.SOLUTION: An exposure device configured so that a projection optical system having a correction optical element transfers a pattern of an original plate to a substrate by projecting the pattern onto the substrate comprises: a measuring instrument which detects a mark formed on the original plate to evaluate an overlay error and a mark formed on the substrate, and measures a misregistration between the mark on the original plate and the mark on the substrate; a plurality of drive units for deforming the correction optical element; and a control unit which controls the plurality of drive units on the basis of the measurement results by the measuring instrument so that the overlay error is reduced when the pattern of the original plate is transferred to the substrate. The control unit repeats a drive amount determination operation for determining a drive amount of the correction optical element until the overlay error comes in the allowable range. |
