| 摘要 |
<p>This substrate processing apparatus transfers a flexible long substrate (S) in the length direction in a state wherein the substrate is supported by means of a part of the circumferential surface of a rotating rolling body (30), and a pattern formed on the circumferential surface of a rotatable mask that can rotate is repeatedly transferred to a substrate surface to be processed. The substrate processing apparatus is provided with: mask holding sections (MU1-MU5), which support the rotatable mask with respect to the rolling body such that a rotatable mask portion involved in the transfer of the outer circumferential surface, and the substrate surface to be processed are disposed at a predetermined interval; and a magnetic gear transmission system (GD) which transmits, by means of a magnetic force, the rotating force of the rolling body or the rotatable mask as the rotating force of the other one of the rolling body and the rotatable mask.</p> |
