METHOD FOR FORMING REACTION DEVELOPMENT IMAGE AND COMPOSITION THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a reaction development image capable of obtaining sufficient photoresist by forming a film (photoresist layer) using a polylactic acid-based resin and a photoacid generating agent, irradiating ultraviolet rays to the photo-resist layer with a desired pattern and then developing an image using aqueous solution containing no organic solvents as a developer.SOLUTION: Sufficient photoresist can be obtained by using a developer aqueous solution containing no organic solvents and using a compound which has both a quinonediazide structure having a photosensitive function and a hydroxyl group as a photoacid generating agent. There is provided a method for forming a reaction development image by irradiating ultraviolet rays to a photoresist layer with a desired pattern and then washing the layer with an aqueous solution containing an inorganic alkali represented by MOH (wherein M represents an alkali metal), wherein the photo-resist layer is composed of a polylactic acid-based resin and a compound (photoacid generating agent) which has both an organic group having a quinonediazide structure and a hydroxyl group.