| 摘要 |
PROBLEM TO BE SOLVED: To measure position information about a mobile body in a direction orthogonal to a moving plane with high precision.SOLUTION: An exposure apparatus comprises: a wafer stage WST having a mounting area for a wafer W, and movable in an x axis direction and a y axis direction orthogonal to each other within an xy plane perpendicular to an optical axis of an optical system PL; and a measuring device which has a plurality of sensors (72, 74, 76) that are adapted to radiate respective measuring beams to scale members (39Y, 39Y) used in measuring position information about the wafer stage WST in a direction parallel to the xy plane and forming reflective gratings, and are different in detection point position in at least either of the x axis direction and the y axis direction, and which can use sensors of the plurality of sensors whose detection point is positioned within a grating surface of the scale members to measure position information about the wafer stage WST in the optical axis direction (z axis direction) perpendicular to the xy plane. |
