| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspection device capable of detecting a minute defect present on a surface or an end face of a substrate such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed.SOLUTION: A defect inspection device comprises an illumination optical system 101, a plurality of detection optical systems 102 and a signal processing unit 105. When inspecting a portion around an edge part of a sample and a portion around an edge grip part of the sample, in detection optical systems 41 and 87 into which at least one of diffracted light generated around the edge part of the sample and diffracted light generated from the edge grip part of the sample enters among the plurality of detection optical systems, light-shielding means shields the entering diffracted light, on the basis of a signal obtained by monitoring strength of the entering diffracted light. |
