发明名称 THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
摘要 <p>A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.</p>
申请公布号 NL2010642(A) 申请公布日期 2013.11.20
申请号 NL20132010642 申请日期 2013.04.16
申请人 ASML NETHERLANDS B.V. 发明人 JACOBS JOHANNES;WESTERLAKEN JAN
分类号 G03F7/20 主分类号 G03F7/20
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