| 摘要 |
The present invention relates to an exposure apparatus including a lens and exposes a photosensitive material according to patterns formed on a film. The lenticular exposure apparatus (1) of the present invention includes a substrate structure (9), a light source device (2) and other devices including an opening and closing device. In the present invention, the light source device (2) comprises a light source (4), a convex lens (5), or a light source (4) and lens combination (5). |
