| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspection method easily and certainly checking the penetration of a gas jetting vent hole formed in a silicon electrode plate for a plasma processing apparatus. <P>SOLUTION: A vent hole inspection device 10 includes: a device body 20 having an opening 21a covered with a silicon electrode plate 50 for a plasma processing apparatus and capable of storing a test fluid F in an inside 20a thereof; a fluid feeder 30 for feeding the test fluid F at a desired pressure to the inside 20a of the device body 20; and a closing plate 40 for covering and closing some of a plurality of holes 51 of the silicon electrode plate 50. The test fluid F is allowed to pass through the plurality of holes 51 formed in the thickness direction in the silicon electrode plate 50, and a penetration state of each hole 51 is inspected based on each jet height of the test fluid F passing through the holes 51 to be inspected. <P>COPYRIGHT: (C)2011,JPO&INPIT |
