Illumination system for illuminating a mask in a microlithographic exposure apparatus
摘要
A diffractive optical element (156) is configured to be inserted into a light beam path of an illumination system (112) of a microlithographic projection exposure apparatus (10) such that it produces a desired intensity distribution in a system pupil surface (154) of the illumination system, wherein a Fourier transform of an angular distribution produced by the diffractive optical element (156) differs from the desired intensity distribution.
申请公布号
EP2388650(B1)
申请公布日期
2013.11.20
申请号
EP20110006781
申请日期
2008.12.13
申请人
CARL ZEISS SMT GMBH
发明人
SCHUBERT, ERICH;KOHL, ALEXANDER;ZIEGLER, GERHARD-WILHELM;PATRA, MICHAEL;DEGUENTHER, MARKUS;LAYH, MICHAEL