发明名称 APPARATUS FOR FABRICATING SILICON SYNGLE CRYSTAL INGOT AND METHOD FOR FABRICATING SILICON SYNGLE INGOT
摘要 PURPOSE: An apparatus for manufacturing a silicon single crystal ingot and a manufacturing method for the same are provided to uniformly control oxygen concentration between lattices in the single crystal ingot by providing oxygen interstitials to the single crystal ingot through a microelement supply part. CONSTITUTION: A quartz crucible(20) receives a silicon melt(62). A lifting device(30) lifts a silicon epitaxial ingot(60) grown from the silicon melt. A heat shield(40) shields heat emitted from the silicon single crystal ingot. One or more microelement supply parts(50) are placed at a lower portion of the heat shield. The microelement supply part is formed into a cylindrical shape.
申请公布号 KR101331759(B1) 申请公布日期 2013.11.20
申请号 KR20110025224 申请日期 2011.03.22
申请人 发明人
分类号 C30B15/00;C30B29/06;H01L21/02 主分类号 C30B15/00
代理机构 代理人
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