发明名称 |
APPARATUS FOR FABRICATING SILICON SYNGLE CRYSTAL INGOT AND METHOD FOR FABRICATING SILICON SYNGLE INGOT |
摘要 |
PURPOSE: An apparatus for manufacturing a silicon single crystal ingot and a manufacturing method for the same are provided to uniformly control oxygen concentration between lattices in the single crystal ingot by providing oxygen interstitials to the single crystal ingot through a microelement supply part. CONSTITUTION: A quartz crucible(20) receives a silicon melt(62). A lifting device(30) lifts a silicon epitaxial ingot(60) grown from the silicon melt. A heat shield(40) shields heat emitted from the silicon single crystal ingot. One or more microelement supply parts(50) are placed at a lower portion of the heat shield. The microelement supply part is formed into a cylindrical shape. |
申请公布号 |
KR101331759(B1) |
申请公布日期 |
2013.11.20 |
申请号 |
KR20110025224 |
申请日期 |
2011.03.22 |
申请人 |
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发明人 |
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分类号 |
C30B15/00;C30B29/06;H01L21/02 |
主分类号 |
C30B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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