APPARATUS FOR THIN FILM DEPOSITION

摘要

The present invention relates to a thin film deposition apparatus. The thin film deposition apparatus includes: a process chamber having inner space; and a deposition source which is movably installed along a first direction in the inner space of the process chamber and emits organic material. The process chamber is horizontally located in order for the deposited side of the substrate to be toward the bottom, and at least two deposition areas are provided in parallel along the first direction. The deposition source emits the organic material to the deposited side of the substrate located in the deposition area as moving the deposition areas along the first direction sequentially.