发明名称 SULFONE COMPOUND, SULFONIC ACID SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION
摘要 A compound has a partial structure shown by a following formula (1), wherein R1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.
申请公布号 KR101330944(B1) 申请公布日期 2013.11.18
申请号 KR20107008086 申请日期 2008.10.14
申请人 发明人
分类号 C07C309/19;C07C381/12;G03F7/004 主分类号 C07C309/19
代理机构 代理人
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