| 摘要 |
PURPOSE: A vacuum deposition system is provided to reduce tact time and to facilitate the management of particles by transferring a carrier to the lower part of a processing chamber. CONSTITUTION: A vacuum deposition system comprises a processing chamber(21) and a transfer chamber(25). Carriers on which a circuit board is attached are transferred to the processing chamber. A deposition process of the circuit boards is implemented in the processing chamber. The transfer chamber is arranged under the processing chamber so that carriers on which the circuit board is unloaded can be transferred. |
