| 摘要 |
The present invention relates to a backlight unit and an illumination system using the same. The backlight unit includes a first reflector, a second reflector, and an optical source module which is arranged between the first reflector and the second reflector. The second reflector includes a first reflective region which is adjacent to the optical source module and a second reflective region which is adjacent to the first reflective region. The first reflective region includes a plurality of patterns. The patterns are distant from the optical source module over 10 mm or more. The closest pattern to the optical source module is distant from the optical source module at 10.01 mm. The farthest pattern from the optical source module is distant from the optical source module at 15.00 mm. [Reference numerals] (AA) Air guide;(BB,CC) Pattern region;(DD,GG) First region;(EE,FF) Second region |
