发明名称 FILM-FORMING METHOD
摘要 The method for depositing a film of the present invention comprises the first irradiation step of irradiating particles having energy on a surface of a substrate 101, the first film deposition step of depositing a first film 103 on the surface of the substrate 101 subjected to the first irradiation step by using a dry process, and the second film deposition step of depositing a second film 105 having oil repellency on a surface of the first film 103. According to the present invention, a method for depositing a film enabling production of an oil-repellent substrate comprising an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.
申请公布号 HK1157827(A1) 申请公布日期 2013.11.15
申请号 HK20110112039 申请日期 2011.11.08
申请人 SHINCRON CO. LTD. 发明人 ICHIRO SHIONO;EKISHU NAGAE;YOUSONG JIANG;TAKUYA SUGAWARA
分类号 C23C;C03C 主分类号 C23C
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