发明名称 ENHANCING SCHOTTKY BREAKDOWN VOLTAGE(BV) WITHOUT AFFECTING AN INTEGRATED MOSFET-SCHOTTKY DEVICE LAYOUT
摘要 This invention discloses a semiconductor power device that includes an active cell area having a plurality of power transistor cells and a junction barrier Schottky (JBS) area. The semiconductor power device includes the JBS area that further includes a plurality of Schottky diodes each having a PN junction disposed on an epitaxial layer near a top surface of a semiconductor substrate wherein the PN junction further includes a counter dopant region disposed in the epitaxial layer for reducing a sudden reversal of dopant profile near the PN junction for preventing an early breakdown in the PN junction.
申请公布号 KR101329997(B1) 申请公布日期 2013.11.15
申请号 KR20087025717 申请日期 2007.04.27
申请人 发明人
分类号 H01L29/76;H01L29/78;H01L29/94 主分类号 H01L29/76
代理机构 代理人
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