发明名称 |
ENHANCING SCHOTTKY BREAKDOWN VOLTAGE(BV) WITHOUT AFFECTING AN INTEGRATED MOSFET-SCHOTTKY DEVICE LAYOUT |
摘要 |
This invention discloses a semiconductor power device that includes an active cell area having a plurality of power transistor cells and a junction barrier Schottky (JBS) area. The semiconductor power device includes the JBS area that further includes a plurality of Schottky diodes each having a PN junction disposed on an epitaxial layer near a top surface of a semiconductor substrate wherein the PN junction further includes a counter dopant region disposed in the epitaxial layer for reducing a sudden reversal of dopant profile near the PN junction for preventing an early breakdown in the PN junction. |
申请公布号 |
KR101329997(B1) |
申请公布日期 |
2013.11.15 |
申请号 |
KR20087025717 |
申请日期 |
2007.04.27 |
申请人 |
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发明人 |
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分类号 |
H01L29/76;H01L29/78;H01L29/94 |
主分类号 |
H01L29/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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