发明名称 |
PURGING OF POROGEN FROM UV CURE CHAMBER |
摘要 |
A method for removing species from a substrate includes arranging a purge ring in a chamber proximate to a pedestal. The purge ring includes an inlet portion and an exhaust portion. The inlet portion defines an inlet plenum and an inlet baffle. The inlet baffle includes a continuous slit that is substantially continuous around a peripheral arc not less than about 270°. The exhaust portion includes an exhaust channel that is located substantially opposite the inlet baffle. The method further includes supplying ozone to the inlet plenum; at least partially defining a ring hole space having a periphery using the inlet portion and the exhaust portion; conveying gas from the inlet plenum into the ring hole space using the inlet baffle; conveying gas and other matter out of a purge space using the exhaust portion; and inhibiting deposition of material evolved from the substrate during curing using the purge ring.
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申请公布号 |
US2013298940(A1) |
申请公布日期 |
2013.11.14 |
申请号 |
US201313944421 |
申请日期 |
2013.07.17 |
申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
SMARGIASSI EUGENE;LAU STEPHEN YU-HONG;KAMIAN GEORGE D.;XI MING |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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