| 摘要 |
PROBLEM TO BE SOLVED: To provide a target which has a high leakage magnetic flux density and few microcracks in a B-rich layer, and to suppress arcing whose origin is the microcrack, in a Co-Cr-Pt-B-based alloy sputtering target.SOLUTION: A Co-Cr-Pt-B-based alloy sputtering target has no more than 10 cracks of 0.1 to 20 μm in a B-rich phase in an area (field of view) of 100 μm×100 μm. A Co-Cr-Pt-B-based alloy cast ingot is hot-forged or hot-rolled, and is then cold-rolled or cold-forged at an elongation rate of 4% or less, and it is machined further to produce the target. In a method for producing the Co-Cr-Pt-B-based alloy sputtering target, the Co-Cr-Pt-B-based alloy cast ingot is hot-forged or hot-rolled, and is then rapidly cooled to -196°C to 100°C, and it is machined further to produce the target. |
