| 摘要 |
An immersion exposure apparatus and method expose a substrate with an exposure beam via an optical assembly and via immersion liquid. A first stage on which a substrate is mounted is positioned below the optical assembly so that the immersion liquid is maintained in a space between the optical assembly and the substrate. The first stage is replaced below the optical assembly with a second stage while maintaining the immersion liquid below the optical assembly. The replacing includes arranging a movable member, which is independently movable relative to the first and second stages and away from below the optical assembly, to face the optical assembly so as to substantially maintain the immersion liquid below the optical assembly while the first and second substrate stages are away from below the optical assembly. A control system controls a drive system to move the first and second stages.
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