发明名称 SUPPORTING APPARATUS, HEATING AND PRESSING APPARATUS, AND HEATING AND PRESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an economical substrate heating and pressing method having excellent throughput by enhancing thermal conducting efficiency.SOLUTION: A heating and pressing method heats and presses a first substrate (W1) and a second substrate (W2). The heating and pressing method comprises: a first suction process (S34) for performing vacuum-suction of the first substrate and the second substrate each at a retention face (TP); a pressing process (S35) for pressing the first substrate and the second substrate through the retention face; a first supplying pressure process (S36) for stopping the vacuum-suction after the supplying pressure process and for supplying gas to spaces between the retention face and the first and second substrates; and a heating process (S37) for heating the substrates.
申请公布号 JP2013232662(A) 申请公布日期 2013.11.14
申请号 JP20130129238 申请日期 2013.06.20
申请人 NIKON CORP 发明人 IZUMI SHIGETO
分类号 H01L21/02;B23K20/00 主分类号 H01L21/02
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