| 摘要 |
Conventionally, there has been no method for automatically selecting a layer to be superimposed, and when there are many layers to be superimposed, extensive time needed for layer selection work has been a problem. The purpose of the invention is, in a defect image analysis device and a defect image analysis system that, by superimposing a defect image for analysis on design layout data, enable identification of a pattern or layer in which a defect has been generated, to improve the efficiency of the work of selecting a layer from the design layout data. The invention is characterized by: generating multiple layer division images by dividing the image for analysis into layers, each of which corresponds to a manufacturing process; finding the degree to which each design layer of the design layout data matches each layer division image; and identifying the design layer with the highest degree of matching among the design layers, said design layer being identified as the design layer corresponding to the layer division image therefor. |
