发明名称 SEMICONDUCTOR-WAFER EVALUATION METHOD AND SEMICONDUCTOR-WAFER EVALUATION DEVICE
摘要 <p>The present invention provides a semiconductor-wafer evaluation method which is a method for evaluating the fracture strength of a notch section of a semiconductor wafer, wherein the fracture strength of a notch section of a semiconductor wafer to be evaluated is evaluated by fracturing the notch section of the semiconductor wafer by applying a load to the notch section in a direction toward the center of the wafer. As a result, it is possible to provide a semiconductor-wafer evaluation method and semiconductor-wafer evaluation device which are capable of more accurately and more sensitively evaluating the fracture strength of the notch section of a semiconductor wafer.</p>
申请公布号 WO2013168360(A1) 申请公布日期 2013.11.14
申请号 WO2013JP02534 申请日期 2013.04.15
申请人 SHIN-ETSU HANDOTAI CO.,LTD. 发明人 SAGARA, KAZUHIRO
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
主权项
地址