| 摘要 |
A sputtering target that includes at least two consolidated blocks, each block' including an alloy including a first metai (e.g., a refractory metal such as molybdenum in an amount greater than about 30 percent by weight) and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks:, the joint being prepared free of any microstructure derived from a diffusion bond of an added loose powder. A process for making the target includes hot isostatically pressing (e.g., below a temperature of 1080°C), consolidated preform blocks that, prior to pressing, have interposed between- the consolidated powder metal blocks at least one continuous solid interface portion. The at least one continuous solid interface portion may include a cold spray body, which may be a mass of cold spray deposited powders on a surface a block, a sintered preform,, a compacted powder body {e.g,, a tile), or any combination thereof. |
