| 摘要 |
Disclosed is a plasma hydrogenation apparatus. According to one embodiment of the present invention, the plasma hydrogenation apparatus comprises: an electromagnetic wave supply portion for oscillating electromagnetic waves of preset frequency; a discharge tube for generating plasma from the electromagnetic waves supplied from the electromagnetic wave supply portion and a hydrogen gas or a mixture gas containing hydrogen; a gas supply portion for volutedly injecting the hydrogen gas or the mixture gas containing hydrogen into the discharge tube; a reactant supply portion for supplying a Si-Cl-based compound to the plasma generated inside the discharge tube; a reactor in which a Si-H-Cl-based compound is generated through the reaction of hydrogen atoms or ions dissociated by the generated plasma and the Si-Cl-based compound; and a product discharge portion for discharging the Si-H-Cl-based compound generated at the reactor. |
