发明名称 |
PREPARATION OF LANTHANIDE-CONTAINING PRECURSORS AND DEPOSITION OF LANTHANIDE-CONTAINING FILMS |
摘要 |
Methods and compositions for depositing rare earth metal-containing layers are described herein. In general, the disclosed methods deposit the precursor compounds comprising rare earth-containing compounds using deposition methods such as chemical vapor deposition or atomic layer deposition. The disclosed precursor compounds include a cyclopentadienyl ligand having at least one aliphatic group as a substituent and an amidine ligand.
|
申请公布号 |
US2013303739(A1) |
申请公布日期 |
2013.11.14 |
申请号 |
US201313940654 |
申请日期 |
2013.07.12 |
申请人 |
AMERICAN AIR LIQUIDE, INC. |
发明人 |
PALLEM VENKATESWARA R.;DUSSARRAT CHRISTIAN |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|