| 摘要 |
PURPOSE: A nozzle and a substrate processing apparatus having the same are provided to minimize flow rate of mixed solution while maintaining concentration and temperature of the mixed solution which is provided to a substrate. CONSTITUTION: A first discharging line(391) discharges first processing liquid to a substrate. The first discharging line receives the first processing liquid from a first supply line(391a) connected to outside. A second discharging line(392) discharges second processing liquid to the substrate. The second discharging line receives the second processing liquid from a second supply line(392a) connected to the outside. A third discharging line discharges deionized water to the substrate. A connection line(394) interlinks the first discharging line and the second discharging line. |
